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High frequency Sputtering System RFS-200


RFS-200
 
Outline

Small-sized high-frequency sputtering device with an RF power supply. Ideal for basic research and development experiments because of the deposition capabilities for metals, semiconductors and insulators.
 
Features

1. It is sputtering system of an insulator, metal, and a semiconducting material.

2.

Oil diffusion pump is used for main pumping.
3. Single deposition is available by dia.80 mm, 1 cathode.
4. Sputtering speed 20nm/min. (SiO2) is available by conventional sputtering.
5. Automatic matching control is available.

Specification
Model
RFS-200
Vacuum performance
Ultimate pressure
6.6 × 10-4Pa
Evacuation time
6.6 × 10-3Pa/5min
Vacuum chamber
Vacuum chamber
Metal chamber (200mm(W)×250mm(D)×150mm(H))
Cathode
dia.80mm, 1way
Standard target
dia.80mm × t1mm
Effective area of sputtering
50mm
Sputtering speed
SiO2, more than 20nm/min at deposition
Film thickness distribution
SiO2, within ±8% at dia.50mm
Substrate heating temperature
Max 350 degrees C
Substrate electrode distance
30mm – 60mm (Variable)
Exhaust system
Main pump
Oil diffusion pump (Water cooling) 150L/sec
Liquid Nitrogen trap
Option
Backing pump
Oil rotary pump 100L/min
Oil mist trap
Oil mist trap OMT-100A
Operation system
Main valve
Clapper valve
Sub valve
Three way valve
Automatic leak valve
Option
Control
Manual control
Control system
RF power supply
Max 200W (0–200W: variable)
Pirani vacuum gauge
G-TRAN
Ionization vacuum gauge
Option
Setup
Overall dimensions
800mm(W) × 725mm(D) × 1635mm(H)
Weight
200kg

Utility
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Model
RFS-200
Power required Single phase, 50/60Hz, 100V, 1.3kVA
Ground terminal A grade (ground resistance/10Ω or less)
Water requirement 5.0L/min (Water temperature : less than 25 degrees C,
Water pressure : 200 – 300kPa (gauge pressure))
Connection (power supply) Vinyl cabtyre cable (with plug) 2m
Connection (ground) Earth cable (sheet copper) 2m
Connection (water piping) Tetoron Braided hose (O.D.dia.15mm × I.D.dia.9mm) 2m (2 lines)

Outline Drawing

Feedthrough Collar
Basic composition

[1]
System rack
[2]
Sample holder
[3]
Front door
[4]
Target
[5]
Viewport
[6]
Substrate electrode
[7]
Gauge port
[8]
Service port
[9]
Shutter
[10]
Backing plate
[11]
Target electrode

Sample holder drawing

[The standard type]
*
We customize according to the purpose of research and development.

Option
Liquid Nitrogen trap
Ionization vacuum gauge
Magnetron
In line trap (OMI-100)
Turbo molecular pump
DC power supply
Introduction gas (2,3 lines)
Automatic leak valve for oil rotary pump

Contact
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ULVAC KIKO, Inc.
Overseas Division
TEL (81) 45-533-0206
FAX (81) 45-533-0204
Please contact us by E-mail here

Copyright (C) 2003 ULVAC KIKO, Inc. All Right Reserved. Ver.4.00 (December 2011)
· The dimensions and specifications of the products listed in this site are subject to change without prior notice for improvement of their performance.