 Special components
Name |
Applications |
| Evaporation Electrode SEREM “PSE-150C” |
Evaporation Electrode. (with an external aut0matic control function)
Control can be done by the combination of the deposition controller and temperature controller according to specifications. |
| Deposition Controller |
Quartz Crystal Deposition Controller.
Monitors the film thickness during evaporation and provides feedback to the evaporation power supply so that the required film thickness and deposition (evaporation) speeds can be kept constant. |
Film thickness sensor
(with dia.30 introduction terminal) |
Film thickness sensor by crystal oscillator.
Evaporation at 100 degrees C or less. |
| Ionization Vacuum Gauge |
For pressure measurement from ultrahigh vacuum range to medium vacuum range. |
| Pirani Vacuum Gauge* |
For pressure measurement of a low vacuum range. |
* It preinstalls in VPC-1100.
|
|
| Power required |
Single phase, 50/60Hz, 200V, 1.5kVA, range of allowable voltage = ±10% |
| Load current |
Max. 150A |
| Control signal |
External automatic control input DC 0–10V/ 0–100% setting inbound impeda 1MΩ |
| Control method |
Thyristor AC phase control method
(Precision of output stability : ±10%, Power variation : ±2%) |
| Rating |
30 min |
| Overall dimension |
480mm(W) × 360mm(D) × 149mm(H)
(Without projection parts and accessories) |
| Weight |
40kg |
| Specification code |
PSE-15C21111 |
PSE-15C31111* |
PSE-15C12211 |
PSE-15C22211 |
PSE-15C32211 |
| Switching function of output position |
Two-point switching |
Three-point switching |
Single-point switching |
Two-point switching |
Three-point switching |
| Switching function of low electric tap |
Option |
Option |
Loading |
Loading |
Loading |
| Automatic control by deposition controller |
Option |
Option |
Loading |
Loading |
Loading |
| Automatic control by temperature indicator controller |
Option |
Option |
Option |
Option |
Option |
| Output remote control |
Option |
Option |
Option |
Option |
Option |
* It preinstalls in VPC-1100.
 Option
| Output position |
: |
Possible to select by electrode composition of evaporation source. |
| Low electric tap |
: |
Effective for small output adjustments of organic matter, etc. |
| Deposition automatic control |
: |
Supports automatic output control using the deposition controller. |
| Temperature automatic control |
: |
Supports automatic output control using the temperature controller. |
| Output remote control |
: |
Effective for an output adjustment while monitoring the interior of the vacuum chamber. |
|
|
|
| |
CRTM-6000G |
CRTM-9000G |
| Film thickness / rate resolution |
0.04Å
(5MHz New Crystal) |
0.00550Å
(5MHz New Crystal) |
0.03Å
(6MHz New Crystal) |
0.00381Å
(6MHz New Crystal) |
| Film thickness display range |
0.001–999.9 kÅ |
0.001–999.9 kÅ |
| Film thickness display resolution |
1 Å |
1 Å |
| Deposition rate display range |
0.1– 999.9Å/s |
0.001–999.9Å/s |
| Number of sensors that can be attached |
1 |
2
(Max. 8 with options) |
| Weight |
3.2 kg |
8 kg |
| Utility |
AC 85–230V, 200VA |
AC 100V±10%, 2A |
| Function |
Film thickness control |
 |
Function |
| Deposition rate control |
|
|
| Time power control |
|
|
| Multi-Layer deposition control |
|
|
| Simultaneous deposition control for sources |
– |
(with options) |
| Extremely low rate deposition control |
– |
|
| Tooling Z-Ratio Calculation function |
– |
|
| Multiple Layer Calculation function |
– |
|
| Saving program |
– |
|
|
|
|
| Baking temperature |
150 degrees C (Max) |
| Maximum sensor head dimensions |
dia.31 × 19 |
| Length from flange to head |
100–800mm |
| Cooling water tube diameter |
4mm |
| Cooling water capacity |
200cc/min |
| Cooling water tube connection |
Synflex tube, 1/4inch joint |
| Standard accessories |
Oscillator, cables, crystal 5pcs |
|
|
|
| Measured pressure range |
5.00 × 10-8–9.99 × 10° Pa |
| Measuring accuracy |
±15% |
| Pressure indication |
Digital indication |
| Line power |
AC100V±10%, 50/60Hz, 52VA |
| Weight |
5.3 kg |
| Overall dimension |
240mm(W) × 380mm(D) × 99mm(H) |
|
|
|
| Measured pressure range |
0.4–2700 Pa |
| Measuring accuracy |
±3% of full scale (linear scale conversion) |
| Pressure indication |
Analog indication |
| Line power |
AC100–240V, 50/60Hz, 10VA |
| Weight |
1 kg |
| Overall dimension |
100mm(W) × 130mm(D) × 100mm(H) |
|
|
|
|
| Measured pressure range |
0.4–2700 Pa |
| Measuring accuracy |
±15%, 51–760Pa
±30%, 10–1000Pa (exclude 51–760Pa)
±50%, 0.4–2700Pa (exclude 10–1000Pa) |
| Pressure indication |
Digital indication |
| Line power |
AC100–240V, 50/60Hz, 10VA |
| Weight |
1 kg |
| Overall dimension |
50mm(W) × 238mm(D) × 99mm(H) |
|
Equipment external system
|
Equipment external system |
Name |
Applications |
| Bell jar cover* |
Handles for Glass bell jar / Splash prevention for glass. |
| Glass bell jar cover |
Glass containers for thin film preparation. |
| Metal bell jar (with water cooling tube) |
Overheating prevention for the interior of bell jars. (an elevating device is required separately) |
| Elevating device* |
For bell jar elevation. (a bell jar cover is required changes) |
| Side panel |
For safety regulation. |
| Back panel |
For safety regulation. |
| System rack |
Simple storage for Ionization Vacuum Gauge and Deposition controller. |
| Control rack |
Storage for control equipment. |
| Side panel for control rack |
For safety regulation. |
| Back panel for control rack |
For safety regulation. |
| * |
It preinstalls in VPC-1100. |
| |
Since the elevating device is designed for glass bell jars, specifications are required to be changed if a metal bell jar is selected. |
 |
|
System rack : Simple storage for measurement hardware.
(*Measurement hardware is option.) |
|
Side panel : For safe regulation management of the main part of system. |
|
Metal bell jar
(with water cooling tube) |
|
For overheating prevention of bell jar |
|
|
Storage for control equipment (*Equipments and panels are optional parts) |
|
Accessories for inner vacuum chamber |
Name |
Applications |
| Sample holder |
Fixation of a sample |
| Adhesion shield plate |
Prevention from thin film adhesion to a bell jar cover inside |
| Electrode partition |
Partition of deposition sources / Prevention of contamination |
| Substrate heating device / SH-350F |
Heating for substrate (sample) / Maximum preset temperature is 350 degrees C |
| Substrate heating device / SH-650F |
Heating for substrate (sample) / Maximum preset temperature is 650 degrees C (Metal bell jar is necessary.) |
| Basic electrode set (for service port) |
Electrode for service port introduction |
| Basic electrode set (for base plate) |
Electrode for base plate introduction |
| Gauge port set |
For dia. 18 gauge port addition |
| Hermetic seal port set |
For hermetic port addition |
| 8P hermetic |
Terminals for turning on electricity |
| 8P hermetic sockets |
Terminal sockets for turning on electricity |
| Sealing flange set (for service port) |
Sealing plug for service port |
| Sealing flange set (for base plate) |
Sealing plug for base plate |
| UFC070 Adapter |
For 070 conflate flange attachment |
| KF-25 Adapter |
For KF-25 flange attachment |
| Sample holder |
Fixation of a sample |
| Gas introduction port |
For gas introduction in vacuum chamber |
| Carbon electrode set |
For making of carbon thin film |
| Other things |
Customizable to meet your needs. Please contact us. |
| Holder A |
 |
|
| Holder B |
 |
|
| Holder C |
 |
|
Holder-soft A
(50-square producing software) |
 |
|
 |
|
 |
Holder-soft B
(M4 screw-tap hole soft) |
 |
|
|
|
These are holders for attaching substrate (glass, silicon wafer and etc.) to make it deposit a thin film. |
|
Prevention from thin film adhesion to a bell jar cover inside |
|
|
For prevention of contamination |
|
|
For 070 conflate flange attachment |
|
|
It is a seal port which introduces electric wires, such as various sensors and measurement, in a vacuum chamber |
|
|
It is a set for gauge port addition introduction. |
|
|
It is s sealing plug of the port which is not used. |
|
| Substrate heating device (SH-1350F) |
|
|
It is a set including a heating stand for heating a substrate, and a measurement apparatus. |
|
For gas introduction in vacuum chamber. |
|
|
|
For making of carbon thin film |
|
Electrode structure options
|
Electrode structure options |
Name |
Applications |
| Evaporated electrode with 3 points |
For single-point + two-point switching evaporation (two points simultaneously)/single layer film or composite membrane and thick film preparations. |
| Evaporated electrode with 4 points |
For two-point switching + two-point switching evaporation (two points simultaneously) / single layer film or composite membrane and thick film preparations. |
| Evaporated electrode with 5 points |
For two-point switching + three-point switching evaporation (two points simultaneously) / single layer film or composite membrane and thick film preparations. |
| EB deposition of 1 point type |
1 point type of deposition for refractory material. (Metal bell jar is necessary) |
| EB deposition of 4 switching points |
4 switching points type of deposition for refractory material. (Metal bell jar is necessary) |
| EB deposition of 1 point type + resistance heating of 1 point type* |
1 point type of deposition for refractory material + 1 point type of deposition with resistance heating. (Metal bell jar is necessary) |
| EB deposition of 1 point type + resistance heating of 2 points type* |
1 point type of deposition for refractory material + 2 switching points type of deposition with resistance heating. (Metal bell jar is necessary) |
| EB deposition of 4 switching points + resistance heating of 1 point type* |
4 switching points type of deposition for refractory material + 1 point type of deposition with resistance heating. (Metal bell jar is necessary) |
| EB deposition of 1 point type + resistance heating of 2 points type* |
4 switching points type of deposition for refractory material + 2 switching points type of deposition with resistance heating. (Metal bell jar is necessary) |
* The evaporation source position for resistance heating types is offset from the vacuum-chamber center.
|
VPC-1100 2 points + 2 points |
|
|
VPC-1100 2 points + 3 points |
|
|
VPC-1100 the example corresponding to equipment
EB 4 points + resistance 2 points |
|
 |
 |
 |
Pumping system
|
Name |
Applications |
| Automatic leak valve for Oil rotary vacuum pump |
For venting when a backing pump stops. (For the main pump protection from power outage) |
| Liquid Nitrogen trap |
For adsorption of condensation gas and back flow oil. |
| Oil-mist trap |
For the oil mist escape prevention from an oil rotary vacuum pump exhaust port. |
| In-line trap |
For the oil mist escape prevention from an oil rotary vacuum pump exhaust port and piping connection to exhaust pipe. |
|
For the oil mist escape prevention from an oil rotary vacuum pump exhaust port and return it to the pumps oil reservoir. |
|
|
For the oil mist escape prevention from an oil rotary vacuum pump exhaust port and piping connection to exhaust pipe. |
|
* Customizable to meet your needs. Please contact us.
top of page
ULVAC KIKO, Inc. |
Overseas Division |
TEL (81) 45-533-0206 |
FAX (81) 45-533-0204 |
Please contact us by E-mail → here |
|
|
